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Electrical Impact of SiC Structural Crystal Defects on High Electric Field Devices

机译:SiC结构晶体缺陷对高电场器件的电影响

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摘要

Commercial epilayers are known to contain a variety of crystallographic imperfections. including micropipes, closed core screw dislocations. low-angle boundaries, basal plane dislocations, heteropolytypic inclusions, and non-ideal surface features like step bunching and pits. This paper reviews the limited present understanding of the operational impact of various crystal defects on SiC electrical devices. Aside from micropipes and triangular inclusions whose densities have been shrinking towards manageably small values in recent years, many of these defects appear to have little adverse operational and/or yield impact on SiC-based sensors, high-frequency RF, and signal conditioning electronics. However high-power switching devices used in power management and distribution circuits have historically (in silicon experience) demanded the highest material quality for prolonged safe operation, and are thus more susceptible to operational reliability problems that arise from electrical property nonuniformities likely to occur at extended crystal defects. A particular emphasis is placed on the impact of closed-core screw dislocations on high-power switching devices, because these difficult to observe defects are present in densities of thousands per cm,in commercial SiC epilayers. and their reduction to acceptable levels seems the most problematic at the present time.
机译:已知商业外延层包含多种晶体学缺陷。包括微管,封闭式芯螺钉错位。低角度边界,基面位错,异型夹杂物和不理想的表面特征(如台阶束和凹坑)。本文回顾了目前对各种晶体缺陷对SiC电气设备的操作影响的了解有限。除了微管和三角形夹杂物的密度近年来已逐渐降低至可控的小值外,这些缺陷中的许多缺陷似乎对基于SiC的传感器,高频RF和信号调理电子设备几乎没有不利的操作和/或产量影响。但是,电源管理和配电电路中使用的大功率开关设备一直以来(就硅经验而言)都要求具有最高的材料质量,以保证长期安全运行,因此更容易受到操作可靠性问题的影响,这些问题是由长期可能发生的电性能不均匀性引起的晶体缺陷。特别要注意的是闭芯螺杆错位对高功率开关器件的影响,因为在商业化的SiC外延层中,这些难以观察到的缺陷以每厘米数千的密度存在。而将其降低到可接受的水平似乎是目前最棘手的问题。

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    Neudeck, Philip G.;

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  • 年度 1999
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